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Polymerization and Thin-Film Growth -- Collision-Induced Processing | |
The following sources are recommended by a professor whose research specialty is thin-film growth. |
· H. Usui, "Polymeric film deposition by ionization-assisted method for optical and optoelectronic applications," Thin Solid Films 365, 22-29 (2000).
· S.B. Sinnott, L. Qi, O.A. Shenderova, and D.W. Brenner, "Modeling condensed-phase chemistry with analytic potentials: Application to hydrocarbon cluster dynamics," in Chapter 1 of Volume IV of Advances in Classical Trajectory Methods: Molecular Dynamics of Clusters, Surfaces, Liquids, and Interfaces, Ed. W. Hase JAI Press, pp. 1-26 (1999).
· M.B.J. Wijesundara, L. Hanley, B. Ni, and S.B. Sinnott, "Effects of unique ion chemistry on thin-film growth by plasma-surface interactions," Proceedings of the National Academy of Science, USA 97, 23-27 (2000).
· T.A. Plaisted, B. Ni, J.D. Zahrt, and S.B. Sinnott, "Comparison of growth of hydrocarbon thin films by molecular-beam and cluster-beam deposition: Atomistic simulations," Thin Solid Films 381, 73-83 (2001).
· P.M. St. John, R.D. Beck, and R.L. Whetten, "Reactions in cluster-surface collisions," Phy. Rev. Lett. 69, 1467-1470 (1992).
· T. Raz and R.D. Levine, "Four-center reactions induced by cluster impact," J. Am. Chem. Soc. 116, 11167-11168 (1994).
· R.S. Averback, M. Ghaly, and H. Zhu, "Cluster-solid interactions: A molecular dynamics investigation," Radiat. Eff. Defects Solids 130-131, 211-224 (1994).
· H. Haberland, Z. Insepov, and M. Moseler, "Molecular dynamics simulation of thin-film growth by energetic cluster impact," Phys. Rev. B 51, 11061-11067 (1995).
· L. Qi and S.B. Sinnott, "Effect of cluster size on the reactivity of organic molecular clusters: Atomistic simulations," Nucl. Inst. and Meth. B 140, 39-46 (1998).
· H. Haberland, M. Mall, M. Moseler, Y. Qiang, T. Reiners, and Y. Thurner, "Filling of micron-sized contact holes with copper by energetic cluster impact," J. Vac. Sci. Technol. A 12, 2925-2930 (1994).
· L. Hanley and S.B. Sinnott, "The growth and modification of materials via ion-surface processing," Surf. Sci. 500, 500-522 (2001).
· V. Bykov, L. Houssiau, and J.W. Rabalais, "Real-space surface crystallography from ion scattering," J. Phys. Chem. B 104, 6340-6352 (2000).
· E. Grossman, G.D. Lemport, J. Kulik, D. Marton, J.W. Rabalais, and Y. Lifshitz, "Role of ion energy in determination of the sp3 fraction of ion beam deposited carbon beams," Appl. Phys. Lett. 68, 1214-1216 (1996).
· W. Jacob, "Surface reactions during growth and erosion of hydrocarbon films," Thin Solid Films 326, 1-42 (1998).
· A.A. Tsekouras, M.J. Iedema, G.B. Ellison, and J.P. Cowin, "Soft-landed ions: A route to ionic solution studies," Inter. J. Mass. Spectrom. 174, 219-230 (1998).
· H. Luo, S.A. Miller, R.G. Cooks, and S.J. Pachuta, "Soft landing of polyatomic ions for selective modification of fluorinated self-assembled monolayer surfaces," Inter. J. Mass Spectrom. 174, 193-217 (1998).
· J.A. Burroughs and L. Hanley, "Molecular ion modification of a hexanethiolate self-assembled monolayer during surface-induced dissociation," Anal. Chem. 66, 3644-3650 (1994).
· E.T. Ada, L. Hanley, S. Etchin, J. Melngailis, W.J. Dressick, M.-S. Chen, and J.M. Calvert, "Ion beam modification and patterning of organosilane self-assembled monolayers," J. Vac. Sci. Technol. B 13, 2189-2196 (1995).
· T.C. Nguyen, D.W. Ward, J.A. Townes, A.K. White, K.D. Krantzman, and B.J. Garrison, "A theoretical investigation of the yield-to-damage enhancement with polyatomic projectiles in organic SIMS," J. Phys. Chem. B 104, 8221-8228 (2000).
· H. Yasuda, Plasma Polymerization, Academic Press (1985).
· R.L. Kostelak, T.W. Weidman, S. Vaidya, O. Joubert, S.C. Palmateer, and M. Hibbs, "Application of plasma polymerized methylsilane resist for all-dry 193 nm deep ultraviolet processing," J. Vac. Sci. Technol. B 13, 2994-2999 (1995).
· C.-M. Chan, T.-M. Ko, and H. Hiraoka, "Polymer surface modification by plasmas and photons," Surf. Sci. Rep. 24, 1-54 (1996).
· F.F. Shi, "Developments in plasma-polymerized organic thin films with novel mechanical, electrical, and optical properties," J.M.S.R. Macromol. Chem. Phys. C36, 795-826 (1996).
· P.C. Zalm, "Elementary processes in plasma-surface interactions with emphasis on ions," Pure Appl. Chem. 57, 1253-1264 (1985).
· D.B. Graves, M.J. Kushner, J.W. Gallagher, A. Garscadden, G.O. Oehrlein, and A.V. Phelps, Database Needs for Modeling and Simulation of Plasma Processing: Report by the Panel on Database Needs in Plasma Processing, National Research Council, National Academic Press (1996).
· I. Bello, W.H. Chang, and W.M. Lau, "Importance of the molecular identity of ion species in reactive ion etching at low energies," J. Vac. Sci. Technol. A 12, 1425-1430 (1994).
· E.T. Ada, O. Kornienko, and L. Hanley, "Chemical modification of polystyrene surfaces by low-energy polyatomic ion beams," J. Phys. Chem. B 102, 3959-3966 (1998).
· T. Sikola, D.G. Armour, and J.A.Van den Berg, "In situ study of processes taking place on silicon surface during its bombardment by CFx/Ar ions: Etching versus polymerization," J. Vac. Sci. Technol. A 14, 3156-3163 (1996).
· D. Takeuchi, N. Shimada, J. Matsuo, and I. Yamada, "Shallow junction formation by polyatomic cluster ion implantation," Nucl. Instr. Meth. B 121, 345-350 (1997).
· M. Sosnowski, "The prospects for low energy implantation with large molecular ions -- the case of decaborane," in Applications of Accelerators in Research and Industry: Proceedings of the Fifteenth International Conference, AIP Conference Proceedings 475, American Institute of Physics Press, pp. 775-778 (1999).
· G. Brauchle, S. Richard-Schneider, D. Illig, J. Rockenberger, R.D. Beck, and M.M. Kappes, "Etching nanometer-sized holes of variable depth from carbon cluster impact induced defects on graphite surfaces," Appl. Phys. Lett. 67, 52-54 (1995).
· C.T. Reimann, R.A. Sullivan, J. Axelsson, A.P. Quist, S. Altmann, P. Roepstorff, I. Velazquez, and O. Tapia, "Conformation of highly charged gas-phase lysozyme revealed by energetic surface imprinting," J. Am. Chem. Soc. 120, 7608-7616 (1998).
· K.J. Boyd, A. Lapicki, M. Aizawa, and S.L. Anderson, "Cluster-surface collisions by phase-space compressed guided ion beam methods," Nucl. Inst. and Meth. B 157, 144-154 (1999).
· K. Nordlund, M. Ghaly, R.S. Averback, M. Caturla, T. Díaz de la Rubia, and J. Taurus, "Defect production in collision cascades in elemental semiconductors and fcc metals," Phys. Rev. B 57, 7556-7570 (1998).
· R.S. Averback and M. Ghaly, "Fundamental aspects of defect production in solids," Nucl. Inst. and Meth. B 127/128, 1-11 (1997).
· C.L. Cleveland and U. Landman, "Dynamics of cluster-surface collisions," Science 257, 355-361 (1992).
· U. Even, T. Schek and J. Jortner, "High-energy cluster-surface collisions," Chem. Phys. Lett. 202, 303-307 (1993).
· M.H. Shapiro and T.A. Tombrello, "Simulation of core excitation during cluster impacts," Phys. Rev. Lett. 68, 1613-1616 (1992).
· M.H. Shapiro, T.A. Tombrello, and J. Fine, "A molecular dynamics simulation of collisional excitation mechanisms in Al," Nucl. Inst. and Meth. B 74, 385-395 (1993).
· M.H. Shapiro and T.A. Tombrello, "A molecular dynamics study of Cu dimer sputtering mechanisms," Nucl. Inst. and Meth. B 84, 453-464 (1994).
· M.H. Shapiro, G.A. Tosheff, and T.A. Tombrello, "Animated molecular dynamics simulations of energetic mixed cluster impacts," Nucl. Inst. and Meth. B 88, 81-85 (1994).
· M.H. Shapiro and T.A. Tombrello, "Simulation of sputtering induced by high energy gold clusters," Nucl. Inst. and Meth. B 152, 221-231 (1999).
· K. Yorizane, T. Muramoto, and Y. Yamamura, "Computer studies on reflection and sputtering due to low-energy cluster impacts," Nucl. Inst. and Meth. B 153, 292-297 (1999).
· T.J. Colla and H.M. Urbassek, "Au sputtering by cluster bombardment: A molecular dynamics study," Nucl. Inst. and Meth. B 164-165, 687-696 (2000).
· T. Raz and R.D. Levine, "Concerted vs. sequential four-center reactions: A computational study of high-energy dynamics," J. Phys. Chem. 99, 13713-13715 (1995).
· M.O. Watanabe, N. Uchida, and T. Kanayama, "Impact-energy dependence of hydrogenated Si cluster deposition on Si(111)-(7x7)," Phys. Rev. B 61, 7219-7222 (2000).
· W.L. Brown and M. Sosnowski, "Cluster-solid interaction experiments," Nucl. Inst. and Meth. B 102, 305-311 (1995).
· R.D. Beck, P.S. John, M.L. Homer, and R.L. Whetten, "Impact induced cleaving and melting of alkali-halide nanocrystals," Science 253, 879-883 (1991).
· H. Yasumatsu, S.I. Koizumi, A. Terasaki, and T. Kondow, "Energy redistribution in cluster-surface collisions: I2-(CO2)n onto silicon surface," J. Chem. Phys. 105, 9509-9514 (1996).
· H. Yasumatsu, A. Terasaki, and T. Kondow, "Splitting a chemical bond with a molecular wedge via cluster-surface collisions," J. Chem. Phys. 106, 3806-3812 (1997).
· H. Yasumatsu, S.I. Koizumi, A. Terasaki, and T. Kondow, "Energy redistribution in I2-(CO2)n collision on silicon surface," J. Phys. Chem. A 102, 9581-9585 (1998).
· U. Kalmbach, H. Yasumatsu, S.I. Koizumi, A. Terasaki, and T. Kondow, "Mechanism of wedge effect in splitting of chemical bond by impact of X2-(CO2)n onto silicon surface (X=Br, I)," J. Chem. Phys. 110, 7443-7448 (1999).
· S.T. Ceyer, "New mechanisms for chemistry at surfaces," Science 249, 133-139 (1990).
· J.D. Beckerle, A.D. Johnson, and S.T. Ceyer, "Collision-induced desorption of physisorbed CH4 from Ni(111): Experiments and simulations," J. Chem. Phys. 93, 4047-4065 (1990).
· S.I. Koizumi, H. Yasumatsu, A. Terasaki, and T. Kondow, "Dissociation of ICl-(CO2)n by its impact on silicon surface: The role of core ion," J. Chem. Phys. 111, 6565-6572 (1999).
· H.-P. Kaukonen, U. Landman, and C.L. Cleveland, "Reactions in clusters," J. Chem. Phys. 95, 4997-5013 (1991).
· J.N. Beauregard and H.R. Mayne, "Cluster catalyzed chemisorption of H2 on Si(111)(1x1): Effects of collision speed and cluster geometry," J. Chem. Phys. 99, 6667-6676 (1993).
· T. Raz, I. Schek, M. Ben-Nun, U. Even, J. Jortner, and R.D. Levine, "Dissociation dynamics of diatomic molecules embedded in impact heated rare gas clusters," J. Chem. Phys. 101, 8606-8619 (1994).
· I. Schek, T. Raz, R.D. Levine, and J. Jortner, "Cluster impact chemistry. High-energy collisions of I2ArN clusters with a Pt surface," J. Chem. Phys. 101, 8596-8605 (1994).
· C.L. Kelchner and A.E. DePristo, "Molecular dynamics simulation of low energy cluster deposition during diffusion-limited thin films growth," NanoStructured Mat. 8, 253-269 (1997).
· H. Hsieh and R.S. Averback, "Molecular-dynamics investigations of cluster-beam deposition," Phys. Rev. B 42, 5365-5368 (1990).
· H. Hsieh, R.S. Averback, H. Sellers, and C.P. Flynn, "Molecular-dynamics simulations of collisions between energetic clusters of atoms and metal substrates," Phys. Rev. B 45, 4417-4430 (1992).
· Q. Hou, M. Hou, L. Bardotti, B. Prevel, P. Melinon, and A. Perez, "Deposition of AuN clusters on Au(111) surfaces. I. Atomic-scale modeling," Phys. Rev. B 62, 2825-2834 (2000).
· L. Qi and S.B. Sinnott, "Atomistic simulations of organic thin film deposition via hyperthermal velocity impacts," Journal of Vacuum Science and Technology A 16, 1293-1296 (1998).
· L. Qi, W.L. Young, and S.B. Sinnott, "Effect of surface reactivity on the nucleation of hydrocarbon thin films through molecular-cluster beam deposition," Surface Science 426, 83-91 (1999).
· M.B.J. Wijesundara, Y. Ji, B. Ni, S.B. Sinnott, and L. Hanley, "Quantifying the effect of polyatomic ion structure on thin-film growth: Experiment and molecular dynamics simulations," Journal of Applied Physics 88, 5004-5016 (2000).
"The Infography about Collision-Induced Processing in Polymerization and Thin-Film Growth"
http://www.infography.com/content/724249404726.html
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